SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE,申请号KR20117007195-传众专利搜索

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发明名称	SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE
摘要
申请公布号	KR20110063790(A)	申请公布日期	2011.06.14
申请号	KR20117007195	申请日期	2009.09.29
申请人	TOKYO ELECTRON LIMITED	发明人	HONDA MINORU;NAKANISHI TOSHIO;KOHNO MASAYUKI;MIYAHARA JUNYA
分类号	H01L21/316	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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