发明名称 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD
摘要 <p>A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The first wavelength is larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.</p>
申请公布号 KR20110063789(A) 申请公布日期 2011.06.14
申请号 KR20117007176 申请日期 2009.07.29
申请人 ASML NETHERLANDS B.V. 发明人 SOER WOUTER ANTHON;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;JAK MARTIN JACOBUS JOHAN
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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