发明名称 Coordinate measuring machine for measuring structures on a substrate
摘要 A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).
申请公布号 US7961334(B2) 申请公布日期 2011.06.14
申请号 US20080220808 申请日期 2008.07.29
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 BOESSER HANS-ARTUR;HEIDEN MICHAEL;ADAM KLAUS-DIETER
分类号 G01B11/02 主分类号 G01B11/02
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