发明名称 Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate
摘要 A thin film transistor substrate, wherein the moving area of electrons between source and drain electrodes of a thin film transistor (TFT) is minimized, the moving distance of electrons is increased, and the sizes of capacitors defined by a gate electrode together with the respective source and drain electrodes are identical to each other so that an off current generated when the TFT is off can be minimized; a method of manufacturing the thin film transistor substrate; and a mask for manufacturing the thin film transistor substrate. Accordingly, it is possible to minimize an off current induced due to a phenomenon of electron trapping by light.
申请公布号 US7960221(B2) 申请公布日期 2011.06.14
申请号 US20100755920 申请日期 2010.04.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LIM DO GI;LEE JONG HWAN;LEE HONG WOO;KIM YONG JO;LEE YONG WOO
分类号 H01L21/00;H01L21/84 主分类号 H01L21/00
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