摘要 |
Ultraviolet light is enabled to be irradiated to an object to be treated with high efficiency while reducing a management burden on an ultraviolet light irradiation device as much as possible. The ultraviolet light irradiation device in which discharge lamps for irradiating ultraviolet light to the object to be treated, and a gas supplying means for supplying gas to the space between the discharge lamps and the object to be treated are provided, wherein the gas supplying means comprises blow-off ports for the gas arranged on the lateral sides of the discharge lamps, and a shield covering the space around the discharge lamps on the opposite side of the side on which the object to be treated exists. |