发明名称 Linear semiconductor processing facilities
摘要 Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities for vacuum-based semiconductor processing and handling, as well as linkable or extensible semiconductor processing facilities that can be flexibly configured to meet a variety of constraints.
申请公布号 US7959403(B2) 申请公布日期 2011.06.14
申请号 US20070846290 申请日期 2007.08.28
申请人 发明人 VAN DER MEULEN PETER
分类号 H01L21/677;B25J17/00;B65G1/00;B66C1/00;F26B5/04;F26B13/30;G06F7/00;G06F19/00;H01L;H01L21/00 主分类号 H01L21/677
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