| 摘要 |
PURPOSE: A substrate processing apparatus is provided to easily correspond the surface roughness of a substrate loading surface when the surface roughness of the substrate loading surface is out of an adequate range. CONSTITUTION: A rotary table(2) rotates inside a vacuum container(1). A substrate loading unit is detachably installed to the rotary table. The substrate loading unit includes a concave part on the upper side of the rotary table. A position restricting part is installed at least one side of the rotary table and the substrate loading unit and restricts the movement of a substrate based on centrifugal force. A reaction gas supplying part supplies reaction gas to the upper side of the rotary table. |
