| 摘要 |
PURPOSE: A plasma processing device and method are provided to make a cleaning gas supply unit vertically move in a reaction chamber, thereby certainly cleaning the entire reaction chamber. CONSTITUTION: A reaction space is placed in a reaction chamber. A substrate support stand(110) is placed on the lower side of the reaction chamber. A shower head(120) is placed on the reaction chamber and faces the substrate support stand. A cleaning gas spray unit is separated from the shower head, vertically moves, and sprays a cleaning gas into the reaction chamber. The cleaning gas injector dies of resentment the cleaning gas. The driving part moves up and downs the cleaning gas injector.
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