GAS PROVIDING PLATE FOR PLASMA GENERATION AND APPARATUS FOR GENERATING PLASMA

摘要

PURPOSE: A gas providing plate and an apparatus for generating plasma are provided to prevent the shape of an electrode from being transferred on a deposition film, thereby increasing the uniformity of deposition. CONSTITUTION: A base plate(110) has a first side and a second side opposite to the first side. A plurality of grooves(120) is arranged in a first direction. The grooves are formed on a second side. A plurality of gas spray holes(130) is formed between a plurality of grooves to pass the first side and the second side. A first connection groove and a second connection groove are expanded in a first direction to connect the first end and the second end of the grooves.