APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR PRODUCING VACUUM THEREOF

摘要

PURPOSE: A substrate processing device and vacuum condition forming method thereof are provided to shorten the entire processing time, thereby preventing a substrate from being damaged during a conversion process between a vacuum condition and an atmosphere pressure condition in a load lock chamber. CONSTITUTION: A plurality of process lines includes first and second load lock chambers interposed between a vacuum chamber and the atmosphere. A pump unit forms a vacuum condition between the first and second load lock chambers. A balanced valve(150a) is interposed between the first and second load lock chambers to make the vacuum degree equal between the first and second load lock chambers. First and second pumps are combined with the first and second load lock chambers respectively. Common pumps(121,126) are combined with the first and second load lock chambers. A vacuum tank is interposed between the first and second load lock chambers.