发明名称 SENSOR AND SYSTEM FOR MEASURING ELECTRON BEAM
摘要 FIELD: physics. ^ SUBSTANCE: invention relates to a sensor (10) for measuring intensity of an electron beam, formed by an electron beam generator along a path in the direction of a target, lying in the region of the target, where the electron beam is excited by the generator through an output window (24). The sensor (10) is characterised by that it has at least one region (26) of at least one conducting layer (28) lying in the said path and connected to a current sensor, and also by that the said regions (26) of at least one conducting layer (28) are essentially shielded from each other, from the surrounding medium and from the output window (24) by a screen (32), which is formed at the output window (24). The invention also relates to a system containing said sensor. ^ EFFECT: design of a sensor for measuring an electron beam, for which there is no need for additional space and which can be an integral part of the electron output window. ^ 19 cl, 7 dwg
申请公布号 RU2420764(C2) 申请公布日期 2011.06.10
申请号 RU20090100927 申请日期 2007.05.05
申请人 TETRA LAVAL' KHOLDINGZ EHND FAJNEHNS S.A. 发明人 KRISTIANSSON ANDERS;NESLUND LARS OKE;KHALLSTADIUS KHANS;KHAAG VERNER;KHOL'M KURT;TSIGERLIG BENNO
分类号 G01T1/29 主分类号 G01T1/29
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