| 摘要 |
FIELD: metallurgy. ^ SUBSTANCE: procedure consists in successive application of first dioxide layer on transparent polymer substratum by vacuum magnetron sputtering. The layer is sputtered to thickness meeting the requirement: d1T=(25-40)+275ùm/nT (nm), where m=0 or 1, d1T is thickness of the first dielectric layer of titanium dioxide, nt is a refractive index of titanium dioxide, the layer of metal made out of silver, a barrier layer made out of aluminium nitride and having thickness as high, as 3 nm, and the second dielectric layer made out of titanium dioxide to thickness meeting condition: dbXnb+d2TùnT=(25-40)ùnT+275ùk (nm), where db is thickness of a barrier layer of aluminium nitride, nb is a refractive index of aluminium nitride, d2T is thickness of the second dielectric layer of titanium dioxide, k=0 or 1. ^ EFFECT: raised coefficient of attenuation of heat solar radiation at maintaining high transmission efficiency of visible light. ^ 2 cl, 1 dwg, 1 tbl, 1 ex |
