| 摘要 |
<p>PURPOSE: An apparatus and a method for processing substrates are provided to control the flow of air exhausted from a drying chamber by elevating a stage. CONSTITUTION: A drying unit includes a drying chamber(210), a substrate supporting unit(220), and a decompressing unit(230). The drying chamber includes a lower chamber(211), an upper chamber, and a chamber driver(214). The substrate supporting unit is composed of a stage(221), a supporting pin(222), a lift pin(223), and a stage driving part(225) and is located in the internal space(213) of the drying chamber. The decompressing unit decompresses the internal space of the drying chamber.</p> |
