| 摘要 |
PURPOSE: A plasma processing apparatus is provided to minimize the size of the apparatus by omitting unnecessary spaces from the inside of a processing chamber. CONSTITUTION: A lower electrode(202) is installed in a processing chamber. An upper electrode(100) is installed at position corresponding to the lower electrode. A covering body(205) is installed at the upper side of the upper electrode. An annular unit(220) is downwardly protruded along the peripheral part of the upper electrode and is vertically moved by being in connection with the upper electrode. |
