发明名称 |
LITHOGRAPHIC PELLICLE |
摘要 |
PURPOSE: Lithographic pellicles are provided to ensure little haze and little decomposition gas even if an ArF excimer laser light is irradiated to an adhesive layer of an inner wall. CONSTITUTION: Lithographic pellicles comprise a pellicle layer(1), a pellicle frame(3) and a pressure-sensitive adhesive layer(4). The pellicle film is installed to the upper part of the pellicle frame. The adhesive layer is formed at the lower end of the pellicle frame in order to enable the adhesion of the pellicle frame to a substrate. An inner wall adhesive layer(8) consisting of a hardened material of a hardening composition containing a perfluoro compound having a perfluoro structure to a main chain.
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申请公布号 |
KR20110063363(A) |
申请公布日期 |
2011.06.10 |
申请号 |
KR20100122266 |
申请日期 |
2010.12.02 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
SHIRASAKI TORU;FUKUDA KENICHI |
分类号 |
G03F1/62;G03F1/64;H01L21/027 |
主分类号 |
G03F1/62 |
代理机构 |
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主权项 |
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地址 |
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