发明名称 LITHOGRAPHIC PELLICLE
摘要 PURPOSE: Lithographic pellicles are provided to ensure little haze and little decomposition gas even if an ArF excimer laser light is irradiated to an adhesive layer of an inner wall. CONSTITUTION: Lithographic pellicles comprise a pellicle layer(1), a pellicle frame(3) and a pressure-sensitive adhesive layer(4). The pellicle film is installed to the upper part of the pellicle frame. The adhesive layer is formed at the lower end of the pellicle frame in order to enable the adhesion of the pellicle frame to a substrate. An inner wall adhesive layer(8) consisting of a hardened material of a hardening composition containing a perfluoro compound having a perfluoro structure to a main chain.
申请公布号 KR20110063363(A) 申请公布日期 2011.06.10
申请号 KR20100122266 申请日期 2010.12.02
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SHIRASAKI TORU;FUKUDA KENICHI
分类号 G03F1/62;G03F1/64;H01L21/027 主分类号 G03F1/62
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