| 摘要 |
PURPOSE: A wiper unit, a substrate processing apparatus including the same, and a method for processing a substrate using the same are provided to implement a cleaning operation by linearly moving the wiper unit along a cover. CONSTITUTION: A magnetism unit(114) is arranged in a first wiper(110). A second wiper(120) is arranged at the lower side of the first wiper. A second wiper is moved along the first wiper based on magnetic force. The second wiper includes a main body(121), a rotatable roller(123), and a cleaning pad(122) protruded from the upper side of the main body. A magnetism unit is contained in the main body. A guide rail(21) guides the slide of the second wiper by being parallelly arranged to the moving direction of the second wiper.
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