发明名称 Methods to make sidewall light shields for color filter array
摘要 Methods of forming color filters having a light blocking material therebetween. A color filter is formed such that a trench is defined between a color filter and an adjacent color filter. The trench may be formed by exposing the color filter to polymerizing conditions such as, for example, ultraviolet radiation and heat. The trench may also be formed by etching between adjacent color filters. A material is formed within the trench.
申请公布号 US7955764(B2) 申请公布日期 2011.06.07
申请号 US20070785545 申请日期 2007.04.18
申请人 MICRON TECHNOLOGY, INC. 发明人 LIU SAIJIN;BOETTIGER ULRICH C.
分类号 G02B5/20 主分类号 G02B5/20
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