发明名称 Method of radiation generation and manipulation
摘要 A method of managing radiation having a frequency in the terahertz and/or microwave regions. The method comprises providing a semiconducting device having a two-dimensional carrier gas. Plasma waves are generated in the carrier gas using a laser pulse. The frequency of the plasma waves, and as a result, the generated radiation are adjusted using a voltage applied to the semiconducting device.
申请公布号 US7955882(B2) 申请公布日期 2011.06.07
申请号 US20090619758 申请日期 2009.11.17
申请人 SENSOR ELECTRONIC TECHNOLOGY, INC. 发明人 SHUR MICHAEL;RYZHII VICTOR;GASKA REMIGIJUS
分类号 H01L21/00;H01L21/331;H01L31/06;H01S3/094;H01S3/16 主分类号 H01L21/00
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