| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
| 摘要 |
<p>An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including a gas outlet configured to direct a localized gas flow towards the sensor or target so as to displace liquid from the sensor or target over the cover and off the table.</p> |
| 申请公布号 |
NL2005528(A) |
申请公布日期 |
2011.06.07 |
| 申请号 |
NL20102005528 |
申请日期 |
2010.10.15 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GOSEN, JEROEN;CUYPERS, KOEN |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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