发明名称 Measurement apparatus, exposure apparatus, and device manufacturing method
摘要 A measurement apparatus includes a polarization controller which controls polarization of light, a wavefront dividing unit which divides a wavefront of the light, a polarizing unit which polarizes the light, a detector which detects the light, a first driving unit which moves the wavefront dividing unit with respect to the detector, a second driving unit which moves the polarizing unit with respect to the detector, and a processor which calculates the optical characteristics of the detection target using a detection results obtained when the wavefront dividing unit is positioned in the optical path and a detection result obtained when the wavefront dividing unit is positioned outside the optical path.
申请公布号 US7956987(B2) 申请公布日期 2011.06.07
申请号 US20080143169 申请日期 2008.06.20
申请人 CANON KABUSHIKI KAISHA 发明人 OHSAKI YUMIKO
分类号 G03B27/72;G03B27/54 主分类号 G03B27/72
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