发明名称 Method of forming a device wafer with recyclable support
摘要 A method for forming a device wafer with a recyclable support by providing a wafer having first and second surfaces, with at least the first surface of the wafer comprising a semiconductor material that is suitable for receiving or forming electronic devices thereon, providing a supporting substrate having upper and lower surfaces, and providing the second surface of the wafer or the upper surface of the supporting substrate with void features in an amount sufficient to enable a connecting bond therebetween to form a construct wherein the bond is formed at an interface between the wafer and the substrate and is suitable to maintain the wafer and supporting substrate in association while forming or applying electronic devices to the first surface of the wafer, but which connecting bond is severable at the interface due to the void features to separate the substrate from the wafer so that the substrate can be reused.
申请公布号 US7956436(B2) 申请公布日期 2011.06.07
申请号 US20090548623 申请日期 2009.08.27
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 CELLER GEORGE K.
分类号 H01L27/12 主分类号 H01L27/12
代理机构 代理人
主权项
地址