发明名称 Forming a helical inductor
摘要 In one embodiment, the present invention includes an apparatus having a substrate with vias extending between first and second surfaces thereof, and at least one helical inductor adapted within a via, which may be formed of a conductive material. Other embodiments are described and claimed.
申请公布号 US7956713(B2) 申请公布日期 2011.06.07
申请号 US20070903908 申请日期 2007.09.25
申请人 INTEL CORPORATION 发明人 CHANDRASEKHAR ARUN;VENKATARAMAN SRIKRISHNAN;PATEL PRIYAVADAN R.;CHICKAMENAHALLI SHAMALA;FITE ROBERT J.;GURUMURTHY CHARAN
分类号 H01F5/00 主分类号 H01F5/00
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