REDUCED ISOTROPIC ETCHANT MATERIAL CONSUMPTION AND WASTE GENERATION
摘要
Methods and apparatus for isotropically etching a metal from a work piece, while recovering and reconstituting the chemical etchant are described. Various embodiments include apparatus and methods for etching where the recovered and reconstituted etchant is reused in a continuous loop recirculation scheme. Steady state conditions can be achieved where these processes are repeated over and over with occasional bleed and feed to replenish reagents and/or adjust parameters such as pH, ionic strength, salinity and the like.
申请公布号
WO2011028667(A3)
申请公布日期
2011.06.03
申请号
WO2010US47181
申请日期
2010.08.30
申请人
NOVELLUS SYSTEMS, INC.;MAYER, STEVEN, T.;PORTER, DAVID