发明名称 REDUCED ISOTROPIC ETCHANT MATERIAL CONSUMPTION AND WASTE GENERATION
摘要 Methods and apparatus for isotropically etching a metal from a work piece, while recovering and reconstituting the chemical etchant are described. Various embodiments include apparatus and methods for etching where the recovered and reconstituted etchant is reused in a continuous loop recirculation scheme. Steady state conditions can be achieved where these processes are repeated over and over with occasional bleed and feed to replenish reagents and/or adjust parameters such as pH, ionic strength, salinity and the like.
申请公布号 WO2011028667(A3) 申请公布日期 2011.06.03
申请号 WO2010US47181 申请日期 2010.08.30
申请人 NOVELLUS SYSTEMS, INC.;MAYER, STEVEN, T.;PORTER, DAVID 发明人 MAYER, STEVEN, T.;PORTER, DAVID
分类号 H01L21/3063 主分类号 H01L21/3063
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