COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
摘要
A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide represented by formula (I) or derivatives of a polyaminoamide of formula (I) obtainable by complete or partial protonation, N-quarternisation or acylation.
申请公布号
WO2011064154(A2)
申请公布日期
2011.06.03
申请号
WO2010EP67874
申请日期
2010.11.22
申请人
BASF SE;ROEGER-GOEPFERT, CORNELIA;RAETHER, ROMAN BENEDIKT;MAYER, DIETER;EMNET, CHARLOTTE;ARNOLD, MARCO
发明人
ROEGER-GOEPFERT, CORNELIA;RAETHER, ROMAN BENEDIKT;MAYER, DIETER;EMNET, CHARLOTTE;ARNOLD, MARCO
