METHOD AND DEVICE FOR FORMING POLYCRYSTALLINE SILICON

摘要

Disclosed is a device for forming polycrystalline silicon. The disclosed device forms polycrystalline silicon by heat treating amorphous silicon which is formed on a substrate, and is characterized by comprising a pre-heating section (200) which pre-heats amorphous silicon, and a heat treating section (300) which performs crystallization heat treatment on the amorphous silicon that has been pre-heated in the pre-heating section (200).