发明名称 PLASMA PROCESSING APPARATUS
摘要 A gas shower head having many gas discharging ports formed on the lower surface is provided on the top wall of a processing container such that the gas shower head faces a placing table on which a substrate is to be placed, and the top wall of the processing container at the periphery of the gas shower head is composed of a dielectric material. A coil is provided on the dielectric material, and the phase of high frequency waves to be supplied to the gas shower head and the coil is adjusted so that the phase of the electrical field in a processing region above the substrate and the phase of the electrical field in the peripheral region surrounding the processing region are same or opposite to each other.
申请公布号 KR20110059797(A) 申请公布日期 2011.06.03
申请号 KR20117009509 申请日期 2009.11.17
申请人 TOKYO ELECTRON LIMITED 发明人 SAWADA IKUO;KANG, SONG YUN;KASAI SHIGERU
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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