发明名称 |
CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD |
摘要 |
Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition. |
申请公布号 |
WO2011065004(A1) |
申请公布日期 |
2011.06.03 |
申请号 |
WO2010JP06895 |
申请日期 |
2010.11.25 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;TAKASUKA, MASAAKI;ECHIGO, MASATOSHI;OKADA, YU |
发明人 |
TAKASUKA, MASAAKI;ECHIGO, MASATOSHI;OKADA, YU |
分类号 |
C07C43/253;C07B61/00;C07C41/30;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C07C43/253 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|