发明名称 |
ETCHANT COMPOSITION FOR THE FORMATION OF A METAL LINE |
摘要 |
The present invention relates to an etchant composition for the formation of a metal line. The etchant composition can wet-etch, in a batch, a single-layer film formed of one or more metals selected from a group consisting of titanium, titanium alloy, aluminum, and an aluminum alloy, or a multilayer film including a double-layer film, thus simplifying the etching process and improving productivity. Further, the etchant composition of the present invention has a high etching rate, prevents damage to a lower film and equipment, enables uniform etching, provides excellent etching characteristics, eliminates the need for expensive equipment, is advantageous when used for large display devices, and provides remarkable economical advantages. |
申请公布号 |
WO2011010877(A3) |
申请公布日期 |
2011.06.03 |
申请号 |
WO2010KR04807 |
申请日期 |
2010.07.22 |
申请人 |
DONGWOO FINE-CHEM CO., LTD.;LIM, MIN-KI;YANG, SEUNG-JAE;LEE, YU-JIN;PARK, YOUNG-CHUL;KWON, O-BYOUNG |
发明人 |
LIM, MIN-KI;YANG, SEUNG-JAE;LEE, YU-JIN;PARK, YOUNG-CHUL;KWON, O-BYOUNG |
分类号 |
C09K13/08;C23F1/10 |
主分类号 |
C09K13/08 |
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