发明名称 ALIGNMENT OF MATERIAL DEPOSITION SYSTEM WITH SUBSTRATE
摘要 <p>A method for depositing material in a predetermined pattern on a moving substrate includes sensing an orientation and a velocity of the moving substrate. The method further includes rotating a material deposition unit in accordance with the orientation of the moving substrate and translating the material deposition unit in accordance with the orientation and location of the moving substrate. Concurrently with the rotating and translating the material deposition unit, the material deposition unit deposits the material in the predetermined pattern on the moving substrate so as to align the predetermined pattern with the substrate.</p>
申请公布号 WO2011064777(A1) 申请公布日期 2011.06.03
申请号 WO2010IL00992 申请日期 2010.11.29
申请人 XJET LTD.;DOVRAT, MICHAEL;KAHANOVITCH, YARON;ROZVAL, YIGAL;GOTHAIT, HANAN 发明人 DOVRAT, MICHAEL;KAHANOVITCH, YARON;ROZVAL, YIGAL;GOTHAIT, HANAN
分类号 B41J2/00 主分类号 B41J2/00
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