发明名称 METHOD FOR PRODUCING MONOSILANE AND TETRAALKOXYSILANE
摘要 <p>Disclosed is a method for producing monosilane and a tetraalkoxysilane, wherein an alkoxysilane represented by general formula (1) HnSi(OR)4-n (1) (wherein R represents an alkyl group having 1-6 carbon atoms and n represents an integer of 1-3) is subjected to a disproportionation reaction in a gaseous phase in the presence of an inorganic phosphate or a catalyst that has a specific chemical structure based on a heteropolyacid salt structure. In the production method, separation from the solvent can be carried out easily, the reaction proceeds quickly and the conversion rate of the starting materials is high.</p>
申请公布号 WO2011065359(A1) 申请公布日期 2011.06.03
申请号 WO2010JP70883 申请日期 2010.11.24
申请人 SHOWA DENKO K. K.;OHNO HIROMOTO;OHI TOSHIO;ITO HARUAKI;MAKHMUTOV FANIL 发明人 OHNO HIROMOTO;OHI TOSHIO;ITO HARUAKI;MAKHMUTOV FANIL
分类号 C07F7/04;B01J23/30;B01J27/18;B01J27/188;B01J27/19;B01J27/24;C01B33/04 主分类号 C07F7/04
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