发明名称 |
METHOD FOR PRODUCING MONOSILANE AND TETRAALKOXYSILANE |
摘要 |
<p>Disclosed is a method for producing monosilane and a tetraalkoxysilane, wherein an alkoxysilane represented by general formula (1) HnSi(OR)4-n (1) (wherein R represents an alkyl group having 1-6 carbon atoms and n represents an integer of 1-3) is subjected to a disproportionation reaction in a gaseous phase in the presence of an inorganic phosphate or a catalyst that has a specific chemical structure based on a heteropolyacid salt structure. In the production method, separation from the solvent can be carried out easily, the reaction proceeds quickly and the conversion rate of the starting materials is high.</p> |
申请公布号 |
WO2011065359(A1) |
申请公布日期 |
2011.06.03 |
申请号 |
WO2010JP70883 |
申请日期 |
2010.11.24 |
申请人 |
SHOWA DENKO K. K.;OHNO HIROMOTO;OHI TOSHIO;ITO HARUAKI;MAKHMUTOV FANIL |
发明人 |
OHNO HIROMOTO;OHI TOSHIO;ITO HARUAKI;MAKHMUTOV FANIL |
分类号 |
C07F7/04;B01J23/30;B01J27/18;B01J27/188;B01J27/19;B01J27/24;C01B33/04 |
主分类号 |
C07F7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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