发明名称 SELF ALIGNED CARBIDE SOURCE/DRAIN FET
摘要 <p>A field effect transistor includes a metal carbide source portion, a metal carbide drain portion, an insulating carbon portion separating the metal carbide source portion from the metal carbide drain portion, a nanostructure formed over the insulating carbon portion and connecting the metal carbide source portion to the metal carbide drain portion, and a gate stack formed over at least a portion of the insulating carbon portion and at least a portion of the nanostructure.</p>
申请公布号 WO2011064085(A1) 申请公布日期 2011.06.03
申请号 WO2010EP66989 申请日期 2010.11.08
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;CHANG, JOSEPHINE;GUILLORN, MICHAEL;LAVOIE, CHRISTIAN;CABRAL, CYRIL, JR.;GRILL, ALFRED;O'SULLIVAN, EUGENE 发明人 CHANG, JOSEPHINE;GUILLORN, MICHAEL;LAVOIE, CHRISTIAN;CABRAL, CYRIL, JR.;GRILL, ALFRED;O'SULLIVAN, EUGENE
分类号 H01L29/775;H01L29/16;H01L51/05 主分类号 H01L29/775
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