| 摘要 |
<P>PROBLEM TO BE SOLVED: To enhance projection accuracy in a lithographic device. <P>SOLUTION: The lithographic device is equipped with an illumination system constituted to adjust an irradiation beam, a supporting body constituted to support a patterning device capable of forming a patterned irradiation beam by setting a pattern on the sectional surface of the irradiation beam, a substrate table constituted to support a substrate, and a projection system constituted to project the patterned irradiation beam to the target of the substrate. Furthermore, the lithographic device has a projection and transcription measuring structure to measure the optical projection and transcription data of the projection system. The projection and transcription measuring structure is equipped with an optical device to introduce a measuring beam into the projection system during scanning, a detector to detect the measuring beam passing through the projection system during scanning, and a measuring processor to determine the optical projection and transcription data from the detected measuring beam. The optical device and the detector are arranged at the upper-stream end of the projection system. <P>COPYRIGHT: (C)2011,JPO&INPIT |
