| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which provides a pattern having an excellent line width roughness (LWR). <P>SOLUTION: This resist composition contains: a compound generating acid and base when irradiated with a radiation ray; a resin having an acid-labile group and insoluble or hardly soluble in aqueous alkali solutions but soluble in aqueous alkali solutions by the action of acid; and an acid generator. The base, generated by radiating the radiation to the compound which generates acid and base when irradiated with the radiation, is preferably a base satisfying the formula (IB). In the formula (IB); R<SP>1</SP>, R<SP>2</SP>, and R<SP>3</SP>respectively represent 1-12C hydrocarbon groups which may have substituent groups independently; and two or more bases selected from the group of R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>may be tied together to form a ring. <P>COPYRIGHT: (C)2011,JPO&INPIT |
