发明名称 MANUFACTURING METHOD FOR THIN-FILM INTEGRATED CIRCUIT AND MANUFACTURING METHOD FOR IC LABEL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an ultra-thin-film integrated circuit, an IC chip including the thin-film integrated circuit, and the like, because an IC chip made of a silicon wafer is thick, so that when it is mounted on a commodity container itself, the surface thereof becomes uneven, degrading the designability. <P>SOLUTION: The IC chip including a thin-film integrated circuit, unlike an integrated circuit formed from a conventional silicon wafer, has a semiconductor film as an active region (for example a channel region in a thin-film transistor). The IC chip as above is very thin, so that the deseignability is not impaired even if it is mounted on a commodity such as a card or a container. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011109132(A) 申请公布日期 2011.06.02
申请号 JP20110023530 申请日期 2011.02.07
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 ARAI YASUYUKI;ISHIKAWA AKIRA;TAKAYAMA TORU;MARUYAMA JUNYA;GOTO YUGO;FUKUMOTO YUMIKO;EBATO YUKO
分类号 H01L27/12;G06K19/07;G06K19/077;H01L21/02;H01L21/336;H01L21/77;H01L21/84;H01L29/786 主分类号 H01L27/12
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