发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To reduce regions where wiring and semiconductor elements, or the like are not freely arranged. SOLUTION: A semiconductor device includes: a semiconductor substrate 1 with a first surface in which semiconductor elements 3 are formed and a second surface opposite to the first surface; an interlayer insulation film that is formed on the semiconductor substrate and has a first via 7; and a second via 13 that is formed on the semiconductor substrate 1 and a second via 13 connected with the first via 7. The diameter of the first via 7 is smaller than that of the second via. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011108690(A) |
申请公布日期 |
2011.06.02 |
申请号 |
JP20090259237 |
申请日期 |
2009.11.12 |
申请人 |
PANASONIC CORP |
发明人 |
HIRANO HIROSHIGE;ITO FUMITO;OTA YUKITOSHI |
分类号 |
H01L23/52;H01L21/3065;H01L21/3205 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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