发明名称 EDGE DETECTION METHOD, LENGTH MEASUREMENT METHOD, CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technique for dynamically setting the size of an area to be measured, and detecting an edge of a semiconductor pattern with accuracy. SOLUTION: An edge detection method detects the second edge orthogonal to the edge to be detected, and sets a final scan range inside the second edge by scanning an image area which is slightly larger, including the edge of the semiconductor pattern among observed images. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011106947(A) 申请公布日期 2011.06.02
申请号 JP20090261883 申请日期 2009.11.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SUKEGAWA SHIGEKI;OTA YOSHIHIRO
分类号 G01B15/00;H01J37/22;H01J37/28 主分类号 G01B15/00
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