MULTILAYER PHOTORESIST SYSTEMS

摘要

PURPOSE: A multi-layered photoresist system is provided to obtain an under layer for an over-coated photoresist, especially an over-coated silicon-containing photoresist. CONSTITUTION: A coating substrate includes (a) an organic underlayer composition coating layer consisting of a component having an aromatic group and/or alicyclic group and a component having at least one chromophoric groups, on a substrate; and (b) a photoresist composition coating layer consisting of a photoactive component and an Si-containing component on the underlayer composition.