发明名称 |
THIN FILM TRANSISTOR, AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film transistor having improved conductivity of source and drain electrodes while a manufacturing process thereof is simplified, and to provide a method for manufacturing the thin film transistor. SOLUTION: The method for manufacturing a thin film transistor includes the steps of: forming a gate electrode 103 on a substrate 101; forming a gate insulating layer 104 on the gate electrode 103; forming an amorphous silicon layer 105 on the gate insulating layer 104; forming an aluminum layer 111 on the amorphous silicon layer 105, forming a molybdenum tungsten layer 112 on the aluminum layer 111, and forming a source electrode 109 and a drain electrode 110 which composed of a layered product at least including the aluminum layer 111 and the molybdenum tungsten layer 112; and crystallizing a part of the amorphous silicon layer 105 by irradiating a laser beam on the amorphous silicon layer 105 using the source electrode 109 and the drain electrode 110 as a mask to form a channel region. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011109019(A) |
申请公布日期 |
2011.06.02 |
申请号 |
JP20090265311 |
申请日期 |
2009.11.20 |
申请人 |
PANASONIC CORP;PANASONIC LIQUID CRYSTAL DISPLAY CO LTD |
发明人 |
OTAKA SEI;HOTTA SADAKICHI;ODA TOMOHIKO;KATO TOMOYA |
分类号 |
H01L21/336;H01L21/20;H01L21/28;H01L29/417;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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