发明名称 THIN FILM TRANSISTOR, AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor having improved conductivity of source and drain electrodes while a manufacturing process thereof is simplified, and to provide a method for manufacturing the thin film transistor. SOLUTION: The method for manufacturing a thin film transistor includes the steps of: forming a gate electrode 103 on a substrate 101; forming a gate insulating layer 104 on the gate electrode 103; forming an amorphous silicon layer 105 on the gate insulating layer 104; forming an aluminum layer 111 on the amorphous silicon layer 105, forming a molybdenum tungsten layer 112 on the aluminum layer 111, and forming a source electrode 109 and a drain electrode 110 which composed of a layered product at least including the aluminum layer 111 and the molybdenum tungsten layer 112; and crystallizing a part of the amorphous silicon layer 105 by irradiating a laser beam on the amorphous silicon layer 105 using the source electrode 109 and the drain electrode 110 as a mask to form a channel region. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011109019(A) 申请公布日期 2011.06.02
申请号 JP20090265311 申请日期 2009.11.20
申请人 PANASONIC CORP;PANASONIC LIQUID CRYSTAL DISPLAY CO LTD 发明人 OTAKA SEI;HOTTA SADAKICHI;ODA TOMOHIKO;KATO TOMOYA
分类号 H01L21/336;H01L21/20;H01L21/28;H01L29/417;H01L29/786 主分类号 H01L21/336
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