发明名称 GLASS SUBSTRATE FOR MAGNETIC DISK, METHOD FOR MANUFACTURING THE SAME, AND MAGNETIC DISK
摘要 <P>PROBLEM TO BE SOLVED: To solve a problem that a sagging amount is liable to increase at an end in proportion to a polishing time when colloidal silica slurry is used for final polishing by reducing the roll-off of a glass substrate before final polishing. <P>SOLUTION: This method manufactures the glass substrate for a magnetic disk by polishing a circular glass plate. The method includes a process for polishing a main surface of the circular glass plate by using a water soluble organic high polymer having an amino group, at least one water soluble organic high polymer selected from a group composed of a water soluble organic high polymer having an amine base and a water soluble organic high polymer having a quaternary ammonium base, the slurry containing cerium oxide abrasive grain having an average grain diameter of 0.4-1.8 &mu;m, and polishing cloth. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011104691(A) 申请公布日期 2011.06.02
申请号 JP20090260905 申请日期 2009.11.16
申请人 ASAHI GLASS CO LTD 发明人 MIYATANI KATSUAKI;SAKAI TOSHIHIRO;TOMONAGA HIROYUKI
分类号 B24B37/00;B24B37/24;C03C19/00;C09K3/14;G11B5/73;G11B5/82;G11B5/84 主分类号 B24B37/00
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