发明名称 |
GLASS SUBSTRATE FOR MAGNETIC DISK, METHOD FOR MANUFACTURING THE SAME, AND MAGNETIC DISK |
摘要 |
<P>PROBLEM TO BE SOLVED: To solve a problem that a sagging amount is liable to increase at an end in proportion to a polishing time when colloidal silica slurry is used for final polishing by reducing the roll-off of a glass substrate before final polishing. <P>SOLUTION: This method manufactures the glass substrate for a magnetic disk by polishing a circular glass plate. The method includes a process for polishing a main surface of the circular glass plate by using a water soluble organic high polymer having an amino group, at least one water soluble organic high polymer selected from a group composed of a water soluble organic high polymer having an amine base and a water soluble organic high polymer having a quaternary ammonium base, the slurry containing cerium oxide abrasive grain having an average grain diameter of 0.4-1.8 μm, and polishing cloth. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011104691(A) |
申请公布日期 |
2011.06.02 |
申请号 |
JP20090260905 |
申请日期 |
2009.11.16 |
申请人 |
ASAHI GLASS CO LTD |
发明人 |
MIYATANI KATSUAKI;SAKAI TOSHIHIRO;TOMONAGA HIROYUKI |
分类号 |
B24B37/00;B24B37/24;C03C19/00;C09K3/14;G11B5/73;G11B5/82;G11B5/84 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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