| 发明名称 |
LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To make it possible to suppress deterioration of removable members. <P>SOLUTION: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. The plastic sealing portion may be resistant to degradation through exposure to DUV radiation. The plastic sealing portion may have a liquid phobic coating or property. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011109091(A) |
申请公布日期 |
2011.06.02 |
| 申请号 |
JP20100251364 |
申请日期 |
2010.11.10 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
DZIOMKINA NINA VLADIMIROVNA;DE GRAAF ROELOF FREDERIK;VAN DE KERKHOF MARCUS A;ANTONIUS LEENDERS MARTINUS HENDRIKUS;LIEBREGTS PAULUS MARTINUS MARIA;DE ROOIJ GERARDUS MARTINUS ANTONIUS;HOUBEN MARTIJN;BADAM VIJAY KUMAR;SONDAG-HUETHORST JOHANNA ANTOINETTE MARIA;DE KRUIJF NIEK ELOUT |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
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