| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing positioning between a mask and a plate with high precision. <P>SOLUTION: The exposure apparatus which performs positioning between a mask mark disposed on the mask and a plate mark disposed on the plate includes: an image measuring apparatus which simultaneously measures the mask mark and plate mark and acquires an image; a position error arithmetic apparatus which calculates a relative position error between the mask mark and plate mark from the image acquired by the image measuring apparatus; a deviation measuring apparatus which measures a positional deviation from the driving target position of a mask stage mounted with the mask or a plate stage mounted with the plate during an image acquisition period by the image measuring apparatus; and a correction amount arithmetic apparatus which calculates a correction amount for the positioning between the mask plate and plate mark using the positional deviation of the mask stage or plate stage obtained by the deviation measuring apparatus and the position error obtained by the position error arithmetic apparatus. <P>COPYRIGHT: (C)2011,JPO&INPIT |
