发明名称 BASE ISOLATING DEVICE AND EXPOSURE DEVICE SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a base isolating device capable of suppressing damage caused by vibration such as an earthquake, and an exposure device system. <P>SOLUTION: The base isolating device includes a pedestal on which an object is placed, and movement suppressing parts provided to come in point-contact with a plurality of positions of the pedestal and suppressing the movement of the pedestal by a static frictional force and a dynamic frictional force generated between themselves and the pedestal by the point contact. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011106635(A) 申请公布日期 2011.06.02
申请号 JP20090264797 申请日期 2009.11.20
申请人 NIKON CORP 发明人 TAKAHASHI MASATO;YAMAMOTO KOJI;IWATSUKI EMI;UMEZAWA KAORI
分类号 F16F15/02;F16F7/08;G03F7/20;H01L21/027 主分类号 F16F15/02
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