发明名称 SUBSTRATE INSPECTION APPARATUS AND MEASURING OPERATION SYSTEM THEREOF
摘要 PROBLEM TO BE SOLVED: To display not only inspection of the overall surface of a substrate but also local inspection in the substrate without delay to flowing glass or a production line. SOLUTION: A scanning region of each glass substrate is measured over a flowing production line which sequentially moves substrates from an upstream line to a downstream line in each measuring mode. A display screen displays inspection results of two systems of each scan and each substrate. Inspection results of one scan of substrates passed through an optical system, in other words, local inspection results, are displayed, for example, on the right-side region of the display screen without delay to flowing glass over the production line. Inspection results corresponding to one substrate are juxtaposed and displayed on the left-side region of the screen. The inspection results corresponding to one substrate corresponds to a combination of inspection results of each substrate displayed on the right-side of the screen to display coordinates of the position of foreign matter/a defect in the substrate as a map. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011106995(A) 申请公布日期 2011.06.02
申请号 JP20090263187 申请日期 2009.11.18
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IIZUKA MANABU;TOKIWA KOJI
分类号 G01N21/88;G01N21/958 主分类号 G01N21/88
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