发明名称 INSPECTION METHOD AND APPARATUS
摘要 In an embodiment, there is disclosed an inspection method for detecting the presence of imprintable medium on an imprint lithography template. The method includes contacting the imprint lithography template with a marker, the marker being attachable to imprintable medium that may be on the imprint lithography template, the marker being configured to interact with incident radiation when attached to the imprintable medium, directing radiation at the imprint lithography template, and measuring radiation re-directed by the imprint lithography template to attempt to detect presence of a marker that has attached to the imprintable medium, from the interaction of the marker with the incident radiation, and thus detect the presence of imprintable medium to which the marker is attached.
申请公布号 US2011129930(A1) 申请公布日期 2011.06.02
申请号 US20100955550 申请日期 2010.11.29
申请人 ASML NETHERLANDS B.V. 发明人 WUISTER SANDER FREDERIK
分类号 G01N23/00 主分类号 G01N23/00
代理机构 代理人
主权项
地址