APPARATUS FOR FORMING POLY-CRYSTALLINE SILICON AND METHOD THEREOF

摘要

PURPOSE: A device and method for forming poly crystalline silicon are provided to improve productivity by shortening process time of thermally processing amorphous silicon formed on a substrate. CONSTITUTION: A preheating unit(200) pre-heats amorphous silicon. A thermal process unit(400) thermally processes and crystallizes the preheated amorphous silicon. The preheating unit includes a substrate support pin which supports the substrate and a substrate holder support pin which supports a substrate holder(500). A penetration hole is formed on the substrate holder.