发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method that never causes a decline in defect density during a heat treatment, etc. that accompanies the formation of an electrode after forming defects, and reduces an energy loss during switching. SOLUTION: A method of manufacturing a semiconductor device having electrodes on both sides includes steps of: preparing a semiconductor substrate having opposing first and second principal planes; forming a pn-junction on the first principal plane side of the semiconductor substrate; forming an electrode on the first and second principal planes of the semiconductor substrate; introducing a defect wherein defects are introduced by casting a charged particle beam from the first or second principal plane side after formation of the electrodes; and performing annealing wherein a heat ray is cast from the first principal plane side to selectively restore the defects near the pn-junction to reduce the defect density. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011108977(A) 申请公布日期 2011.06.02
申请号 JP20090264733 申请日期 2009.11.20
申请人 MITSUBISHI ELECTRIC CORP 发明人 ONOYAMA AYUMI
分类号 H01L21/336;H01L21/322;H01L29/739;H01L29/78 主分类号 H01L21/336
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