发明名称 Transistor, method of manufacturing the transistor and electronic device including the transistor
摘要 Provided are a transistor, a method of manufacturing the transistor, and an electronic device including the transistor. The transistor may include a passivation layer on a channel layer, a source, a drain, and a gate, wherein the component of the passivation layer is varied in a height direction. The passivation layer may have a multi-layer structure including a silicon oxide layer, a silicon oxynitride layer, and a silicon nitride layer sequentially stacked. The channel layer may include an oxide semiconductor.
申请公布号 US2011127518(A1) 申请公布日期 2011.06.02
申请号 US20100805379 申请日期 2010.07.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG JI-SIM;LEE CHANG-SEUNG;LEE JAE-CHEOL;LEE SANG-YOON;KWON JANG-YEON;LEE KWANG-HEE;SON KYOUNG-SEOK
分类号 H01L29/786;H01L21/44;H01L33/44 主分类号 H01L29/786
代理机构 代理人
主权项
地址