| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle for lithography that reduces foreign substances which is likely to be generated from an air pressure adjusting hole or to pass through the hole. <P>SOLUTION: The pellicle includes a pellicle frame having an air pressure adjusting hole that extends through an outer peripheral face to an inner peripheral face, wherein a ratio (S/L) of the cross-sectional area S (mm<SP>2</SP>) of a cross section of the hole in a direction perpendicular to the depth direction to the length L (mm) in the depth direction of the air pressure adjusting hole is 0.25 to 5.0 mm, and preferably, the cross-sectional area S is 0.5 to 10.0 mm<SP>2</SP>. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
