FILM DEPOSITION SYSTEM AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To suppress the differentiation of the composition of gas in a plasma generation space between the central part of each electrode and the peripheral part of the electrode even if the electrode is enlarged. SOLUTION: A film deposition chamber 100 includes a first electrode 120 and a second electrode 140. High frequency is input to the first electrode 120. The second electrode 140 is arranged so as to be confronted with the first electrode 120, and a flexible substrate 10 having a hole comes into contact therewith. An exhaust hole is formed at the second electrode 140. The exhaust hole exhausts a plasma generation space between the first electrode 120 and the second electrode 140 via the hole of the flexible substrate 10. COPYRIGHT: (C)2011,JPO&INPIT