| 摘要 |
PROBLEM TO BE SOLVED: To reduce the possibility that deposits adhered to a wiper could not be removed completely without lowering throughput of a liquid injection device, in a head maintenance device including a means removing the deposits adhered to the wiper. SOLUTION: In a process of vertically moving only a head guide 50, a wiper cleaner 58 provided in the head guide 50 is brought into sliding contact with from a tip 631 to a side face of a first wiper 63, so as to perform cleaning operation of the first wiper 63. Also, in a process of vertically moving only a wiper unit 60, the wiper cleaner 58 provided in the head guide 50 is brought into sliding contact with from the tip 631 to the side face of the first wiper 63, so as to perform cleaning operation of the first wiper 63. Thus, deposits adhered to the first wiper 63 are removed by the wiper cleaner 58. COPYRIGHT: (C)2011,JPO&INPIT |
